The effect of deposition angle and thickness on structural and optical properties of manganese oxide thin films

Manganese oxide thin films were deposited on glass substrates by electron gun evaporation method under ultra-high vacuum condition. Thickness of the layers was measured 60 and 120 nm, a quartz crystal method. Deposition conditions such as deposition rate, pressure, incidence angle substrate temperature same for all layers. After producing pure manganese post-annealing used in presence uniform oxygen flow 300 (sccm) at 600 K annealing temperature. Optical reflectance transmittance wavelength 350–850 nm spectrophotometer. Kramers–Kronig relations to calculate optical constant. The influence properties is investigated. It found that film thickness plays an important role nanostructures well cause significant variations behavior films. physical materials characterized X-ray diffraction (XRD), FE-SEM, AFM, EDX, UV–Vis techniques.